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Silicon micro mirror
Products and Services > Silicon micro mirror

Fionix provides very unique 45 degree silicon micro mirrors. Ordinary anisotropic wet etching of commercially available silicon (100) wafers produces 54.7 degree sidewall defined by {111} crystallographic planes. The 45 degree reflective surfaces are defined by {110} planes of Si (100) wafers. However, anisotropic etch rate ratio of R(110)/R(100) for both pure KOH and TMAH solution is greater than 1, so it is hard to fabricate {110} surface from silicon (100) wafer. The etch rate ratio of R(110)/R(100) can be inversed and therefore can make 45 degree sidewalls by special additives in both KOH and TMAH solutions. Fionix provides near 45 degree silicon micro mirrors having nm order smoothness.

Specifications:    
- Max mirror height ; ~ 70um   
- Surface smoothness ; <  5nm    
- Mirror angle respect to the bottom surface ; 42 ~ 45 degree    
- Au coating available

 



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Angles of silicon micro mirror